1. Overview of Ion Spectroscopies for Surface Compositional Analysis.- Glossary of Acronyms.- 1. Purposes.- 2. Introduction.- 2.1. Role of Surface Analysis in Surface Characterization.- 2.1.1. Surface Area.- 2.1.2. Real and Clean Surfaces; Solid Forms.- 2.1.3. Structure and Topography.- 2.1.4. Surface Thermodynamics, Equilibrium Shape, and Diffusion.- 2.1.5. Amount Adsorbed and Nature of Adsorbate/Solid Interactions.- 2.1.6. Surface Composition or Purity.- 2.2. Surface Atom Density and Ultrahigh Vacuum.- 2.3. Compositional Depth Profiling.- 2.3.1. Sputtering Mechanism, Yield, and Rate.- 2.3.2. Instrumentation.- 2.3.3. Data Obtained and Typical Results.- 3. Overview of Compositional Surface Analysis by Ion Spectroscopies.- 3.1. Effects of Energetic Ion Impact on Surfaces.- 3.2. Stimulation and Detection in Ion Spectroscopies.- 4. Ion Spectroscopies Using Ion Stimulation.- 4.1. Ion Detection: SIMS, ISS, RBS, NRA, HFS.- 4.1.1. Secondary Ion Mass Spectrometry (SIMS).- 4.1.2. Ion Scattering Spectrometry (ISS).- 4.1.3. Rutherford Backscattering Spectrometry (RBS), Nuclear Reaction Analysis (NRA), and Hydrogen Forward Scattering Spectrometry (HFS).- 4.1.4. Comparisions of SIMS, SNMS, ISS, RBS, AES, and XPS.- 4.2. Photon Detection of Ion-Induced Radiation.- 4.2.1. Particle-Induced X-Ray Emission (PIXE).- 4.2.2. Bombardment-Induced Light Emission (BLE).- 4.3. Electron Detection; Ion Neutralization Spectroscopy (INS).- 4.4. Neutral (Postionized) Detection: SNMS, SALI, SARISA.- 5. Ion Spectroscopies Using Ion Detection.- 5.1. Electron Stimulation: ESD, ESDIAD, EPMA.- 5.1.1. Electron Stimulated Desorption (ESD).- 5.1.2. Electron Stimulated Desorption Ion Angular Distribution (ESDIAD).- 5.2. Photon Stimulation: LAMMA, LIMS.- 5.3. Neutral Stimulation: FAB-SIMS, NSS.- 5.4. Electric Field Stimulation: APFIM, FIMS.- References.- 2. Surface Structure and Reaction Studies by Ion-Solid Collisions.- 1. Introduction.- 2. The Experimental Approach.- 3. How to View the Process.- 3.1. Transport Theories.- 3.2. Molecular Dynamics Calculations.- 3.2.1. Yields.- 3.2.2. Energy and Angular Distributions.- 3.2.3. Clusters.- 3.2.4. Damage to the Substrate.- 3.3. Interaction Potentials.- 3.3.1. Repulsive Pair Potentials and the BCA.- 3.3.2. Attractive Pair Potentials.- 3.3.3. Many-Body Potentials-Metals and the Embedded Atom Method.- 3.3.4. Many-Body Potentials-Silicon and Covalent Solids.- 3.3.5. Many-Body Potentials-Reactions on Surfaces.- 3.3.6. Many-Body Potential-Molecular Solids.- 3.3.7. The Future.- 4. Electronic Effects.- 4.1. Tunneling Model.- 4.2. Bond-Breaking Model.- 4.3. Deexcitation Model for Sputtered Excited Neutral Atoms.- 5. Surface Characterization with Ion Bombardment.- 5.1. Surface Structure Studies.- 5.1.1. Trajectories of Substrate Species.- 5.1.2. Trajectories of Overlayer Species.- 5.1.3. Shadow-Cone Enhanced Desorption.- 5.2. Molecular Composition Studies.- 5.2.1. Intact Molecular Ejection.- 5.2.2. Molecular Recombination During Ejection.- 5.2.3. Prospects for Detection of Desorbed Neutral Molecules.- 6. Conclusions and Prospects.- References.- 3. Particle-Induced Desorption Ionization Techniques for Organic Mass Spectrometry.- 1. Introduction.- 1.1. Ionization Overview.- 1.1.1. Desorption Ionization.- 1.1.2. Nebulization Ionization.- 1.2. Historial Perspective.- 1.3. Instrumentation.- 1.3.1. Source Design.- 1.3.2. Mass Analyzers.- 1.3.3. Detection of Ions.- 2. Spectral Effects of Primary Beam Parameters.- 2.1. Observe or Reverse Irradiation.- 2.2. Angle of Incidence of Primary Beam.- 2.3. Charge State Dependence.- 2.4. Energy Dependence.- 2.4.1. Wavelength Dependence in Laser Desorption.- 2.4.2. Particle Mass and Velocity Dependences.- 2.5. Primary Particle Flux and Dose.- 3. Properties of Secondary Ions.- 3.1. Energy Distribution.- 3.2. Angular Distribution.- 3.3. Time Distribution.- 3.4. Charge Distribution.- 4. Sample Preparation.- 4.1. Neat Samples.- 4.2. Matrices for Sample Preparation.- 4.2.1. Solid Sample Matrices.- 4.2.2. Liquid Sample Matrices.- 4.3. Derivatization Techniques.- 4.3.1. Creation of Preformed Ions.- 4.3.2. Ion Management.- 5. Special Techniques.- 5.1. Chromatographic Interfaces.- 5.1.1. Dynamic Chromatography.- 5.1.2. Static Chromatography.- 5.2. Real Time Analysis.- 5.2.1. Simple Kinetic Studies.- 5.2.2. Catalyzed Reactions.- 5.3. High-Mass Analysis.- 5.3.1. Spectral Appearance.- 5.3.2. Spectral Interpretation.- 5.3.3. Strategies for Increased Mass Range.- 5.4. Mass Spectrometry/Mass Spectrometry.- 5.4.1. Novel Ion Structures.- 5.4.2. Mixture Analysis.- 6. Future Prospects.- References.- 4. Laser Resonant and Nonresonant Photoionization of Sputtered Neutrals.- Glossary of Symbols and Acronyms.- 1. Introduction.- 2. Photoionization.- 3. Experimental Details.- 3.1. Lasers.- 3.2. Ion Beam Systems and Mass Spectrometers.- 3.3. Detection Electronics.- 4. Artifacts, Quantitation, Capabilities, and Limitations.- 4.1. Resonantly Enhanced Multiphoton Ionization (REMPI).- 4.1.1. Inorganic Analyses.- 4.1.2. Organic Analyses.- 4.2. Nonresonant Multiphoton Ionization (NRMPI).- 4.3. Single-Photon Ionization (SPI).- 5. Applications.- 5.1. Depth Profiling of Bulk Material Using REMPI.- 5.2. Multielement Analysis by NRMPI.- 5.3. Depth Profiling of Bulk Material Using NRMPI.- 5.4. Interface Analysis with NRMPI.- 5.5. Analysis of Organic Compounds Using SPI and Ion Beam Desorption.- 5.6. Bulk Polymer Analysis Using SPI and Ion Beam Desorption.- 6. Future Directions.- 7. Summary.- References.- 5. Rutherford Backscattering and Nuclear Reaction Analysis.- 1. Introduction.- 2. Principles of the Methods.- 2.1. Rutherford Backscattering.- 2.1.1. Impact Parameter.- 2.1.2. Kinematics.- 2.1.3. Cross Sections.- 2.1.4. Scattering from the Bulk: Stopping Power.- 2.1.5. The Energy Spectrum.- 2.2. Nuclear Reaction Analysis.- 2.2.1. Kinematics.- 2.2.2. Cross Section.- 2.2.3. Tables of Nuclear Reactions.- 2.3. Hydrogen Detection.- 2.3.1. Forward Recoil Scattering.- 2.3.2. Nuclear Reactions.- 2. Apparatus.- 3.1. General Setup.- 3.2. A UHV Ion Scattering Chamber.- 3.3. Charged Particle Spectrometers.- 4. Quantitative Analysis and Sensitivity.- 4.1. Mass Resolution.- 4.2. Depth Resolution.- 4.3. Quantitative Analysis.- 4.4. Lateral Resolution.- 4.5. Beam Damage and Desorption.- 5. Ion Scattering as a Structural Tool.- 5.1. Shadowing.- 5.2. Channeling.- 5.3. The Surface Peak.- 5.4. Double Alignment and Transmission.- 6. Applications.- 7. Outstanding Strengths of RBS in Relation to AES, XPS, and SIMS.- References.- 6. Ion Scattering Spectroscopy.- 1. Introduction.- 2. Basic Principles.- 2.1. Parameter Range.- 2.2. Binary Collisions.- 2.2.1. Energy Spectrum.- 2.2.2. Interaction Potentials and Cross Sections.- 2.3. Multiple Scattering.- 2.4. Neutralization.- 3. Experimental Techniques.- 3.1. Apparatus.- 3.2. Shadow Cones and Backscattering (ICISS).- 3.3. Direct Recoil Detection.- 4. Calculations.- 4.1. General Consideratons.- 4.2. Numerical Codes.- 4.3. Shadow Cones.- 4.4. Hitting Probability Model.- 5. Analysis of Surface Composition.- 5.1. Compounds and Alloy.- 5.2. Adsorption Layers.- 5.3. Catalysts.- 5.4. Surface Roughness.- 5.5. Isotopic Labeling.- 6. Structure of Crystalline Surfaces.- 6.1. Reconstructed Surfaces, ICISS.- 6.2. Adsorption Layers, Recoil Detection.- 6.3. Defects, Thermal Displacements.- References.- 7. Comparison of SIMS, SNMS, ISS, RBS, AES, and XPS Methods for Surface Compositional Analysis.- 1. Purpose.- 2. Introduction.- 3. Comparison Categories or Criteria.- 3.1. Input/Output Particles, Sample Damage, Measured Quantity, Principal Information Output, and Sampled Depth.- 3.2. Data Collection.- 3.3. Features of the Analytical Methods.- 3.4. Versatility, Ease of Use, and Supporting Data.- 3.5. Specimen and Vacuum Requirements.- 3.6. Summary of Advantages and Limitations.- 3.7. Selection of a Technique.- 4. The Surface Analysis Community.- References.- Standard Terminology Relating to Surface Analysis.- Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces.- Standard Guide for Specimen Handling in Auger Electron Spectroscopy, X-Ray Photoelectron Spectroscopy, and Secondary Ion Mass Spectrometry.- Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS).